Publications

X Author: Danielle C Hutchison

2019

Stern, Rebecca D, Danielle C Hutchison, Morgan R Olsen, Lev N Zakharov, May Nyman, Kristin A Persson, Kurt G Ronse, Paolo A Gargini, Patrick P Naulleau, and Toshiro Itani."Alkyltin Keggin clusters as EUVL photoresist technology."International Conference on Extreme Ultraviolet Lithography 2019International Conference on Extreme Ultraviolet Lithography 2019 (2019). DOI

2018